Multiparticle biased diffusion-limited aggregation with surface diffusion:: A comprehensive model of electrodeposition

被引:46
|
作者
Castro, M [1 ]
Cuerno, R
Sánchez, A
Domínguez-Adame, F
机构
[1] Univ Pontificia Comillas, E-28015 Madrid, Spain
[2] Univ Complutense Madrid, Fac Ciencias Fis, Dept Fis Mat, Grp Interdisciplinar Sistemas Complicados, E-28040 Madrid, Spain
[3] Univ Carlos III Madrid, Grp Interdisciplinar Sistemas Complicados, Dept Matemat, E-28911 Madrid, Spain
来源
PHYSICAL REVIEW E | 2000年 / 62卷 / 01期
关键词
D O I
10.1103/PhysRevE.62.161
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We present a complete study of the multiparticle biased diffusion-limited aggregation (MBDLA) model supplemented with surface diffusion (SD), focusing on the relevance and effects of the latter transport mechanism. By comparing different algorithms, we show that MBDLA + SD is a very good qualitative model for electrodeposition in essentially the whole range of current intensities provided one introduces SD in the model in the proper fashion. We have found that the correct procedure involves simultaneous bulk diffusion and SD, introducing a time scale arising from the ratio of the rates of the two processes. We discuss in detail the different morphologies obtained and compare them to the available experimental data with very satisfactory results. We also characterize the aggregates thus obtained by means of the dynamic scaling exponents of the interface height, allowing us to distinguish several regimes in the mentioned interface growth. Our asymptotic scaling exponents are again in good agreement with recent experiments. We conclude by discussing a global picture of the influence and consequences of SD in electrodeposition.
引用
收藏
页码:161 / 173
页数:13
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