Interstitial boron doping effects on the electronic and magnetic properties of graphitic carbon nitride materials

被引:23
|
作者
Pan, Hongzhe [1 ]
Zhang, Hongyu [2 ]
Liu, Hongmei [1 ]
Chen, Li [1 ]
机构
[1] Linyi Univ, Sch Sci, Linyi 276005, Shandong, Peoples R China
[2] E China Univ Sci & Technol, Dept Phys, Shanghai 200237, Peoples R China
基金
中国国家自然科学基金;
关键词
Graphitic carbon nitride materials; Density functional theory; Boron doping effects; C3N4; G-C3N4; STABILITY;
D O I
10.1016/j.ssc.2014.11.017
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Using first principles calculations based on density functional theory, we explore the interstitial boron doping effects on the geometrical and electronic structures of graphitic carbon nitrides (g-C3N4 and g-C4N3) and reveal the favorable interstitial boron doping configurations. By analyzing the formation energies of boron-doped systems, we show that boron atoms can be easily doped in g-C4N3 rather than in g-C3N4. Boron doping significantly changes the electronic structure of g-C4N3 from half-metallic to metallic system and from magnetism to non-magnetism after different degrees of doping. Analysis of the density of states and the spatial distribution of spin-polarized electron densities provides an insight into the mechanism underlying such changes. The conclusions obtained in this study are helpful for future studies of two dimensional carbon nitride or boron carbonitride materials. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:35 / 40
页数:6
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