Nanometer-scale scratching on the single-crystal silicon surface using an atomic force microscope

被引：0

作者：

Ichida, Y ^{[1
]}

Takahashi, K ^{[1
]}

机构：

[1] Utsunomiya Univ, Fac Engn, Utsunomiya, Tochigi 3218585, Japan

来源：

ABRASIVE TECHNOLOGY: CURRENT DEVELOPMENT AND APPLICATIONS I | 1999年

关键词：

D O I：

暂无

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Nanometer-scale scratching on the polished Si (001) surface has been carried out by using an atomic force microscope with a three-sided pyramidal diamond tip. The minimum normal force which generates a reproducible groove on the Si (001) surface is approximately 50 mu N The straight groove with a depth of 2 nm and a width of 100 nm is successfully generated at a normal force of 70 mu N Then a fine letter "P" (scale: 1.2 x 1.2 x 0.15 mu m) is successfully written by mechanical scratching.

引用

页码：421 / 426

页数：6

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