Gamma irradiation impact on GaN quasi-vertical Schottky barrier diodes

被引:6
|
作者
Bian, Zhaoke [1 ]
Su, Kai [1 ]
Zhang, Jincheng [1 ]
Zhao, Shenglei [1 ]
Zhou, Hong [1 ]
Zhang, Weihang [1 ]
Zhang, Yachao [1 ]
Zhang, Tao [1 ]
Chen, Jiabo [1 ]
Dang, Kui [1 ]
Ning, Jing [1 ]
Hao, Yue [1 ]
机构
[1] Xidian Univ, Sch Microelect, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Shaanxi, Peoples R China
关键词
gallium nitride; gamma irradiation; vertical devices; Schottky barrier diode; Schottky barrier inhomogeneities; ELECTRICAL-PROPERTIES; PERFORMANCE; IMPROVEMENT;
D O I
10.1088/1361-6463/ab4c6f
中图分类号
O59 [应用物理学];
学科分类号
摘要
The impact of gamma irradiation on GaN quasi-vertical Schottky barrier diodes (SBDs) has been investigated for the first time. Compared with original GaN SBDs, the ideality factor decreases from 1.2 to 1.01?1.02 and the on/off ratio increases from 10(9) to 10(12) for the irradiated GaN SBDs. The reduction of dynamic on-resistance from 0.67 m? cm(2) to 0.54 m? cm(2) was observed at the quiescent bias of???100 V compared with the original SBDs. The temperature dependent current characteristics has revealed the existence of Schottky barrier inhomogeneities at the anode/GaN Schottky interface, and the level of barrier inhomogeneities can be effectively suppressed after gamma irradiation. Based on x-ray photoelectron spectroscopy, cathodoluminescence and x-ray diffraction results, the interface state density at the interface and the deep electron trap in the bulk GaN are reduced after gamma irradiation. The voltage dependent capacitance-frequency measurements further confirm that the interface trap states dominate the degraded characteristics of pre-irradiated devices and the trap time constant is estimated to be in the range of 5 ?s to 50 ?s.
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页数:7
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