Surface instability of curved films under surface van der Waals forces

被引：2

作者：

Wang, Xu ^{[1
]}

Schiavone, Peter ^{[2
]}

机构：

[1] East China Univ Sci & Technol, Sch Mech & Power Engn, 130 Meilong Rd, Shanghai 200237, Peoples R China

[2] Univ Alberta, Dept Mech Engn, 10-203 Donadeo Innovat Ctr Engn, Edmonton, AB T6G 1H9, Canada

来源：

EUROPEAN JOURNAL OF MECHANICS A-SOLIDS | 2017年 / 65卷

基金：

中国国家自然科学基金; 加拿大自然科学与工程研究理事会;

关键词：

Surface instability; van der Waals forces; Bifurcation; Curved film; Critical film thickness; ELASTIC THIN-FILM; PATTERN INSTABILITY;

D O I：

10.1016/j.euromechsol.2017.05.001

中图分类号：

O3 [力学];

学科分类号：

08 ; 0801 ;

摘要：

We investigate the surface instability of a curved film interacting with a curved contactor through the action of van der Waals forces. Any one of the two curved boundaries of the film can be subjected to surface interactions while the other is bonded to a curved rigid substrate. In each case, the corresponding bifurcation is governed by the critical value of the relative film thickness. The effects of Poisson's ratio, surface energy and film thickness on the film's instability are discussed in detail leading to a complete picture of stability and bifurcation in the system. (C) 2017 Elsevier Masson SAS. All rights reserved.

引用

页码：271 / 278

页数：8

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