Influence of Si wall thickness of CsI(Tl) micro-square-frustums on the performance of the structured CsI(Tl) scintillation screen in X-ray imaging

被引:3
|
作者
Sun, Zhixiang [1 ]
Gu, Mu [1 ]
Liu, Xiaolin [1 ]
Liu, Bo [1 ]
Zhang, Juannan [1 ]
Huang, Shiming [1 ]
Ni, Chen [1 ]
机构
[1] Tongji Univ, Shanghai Key Lab Special Artificial Microstruct M, Sch Phys Sci & Engn, Shanghai 200092, Peoples R China
基金
中国国家自然科学基金;
关键词
ARRAY TEMPLATE; SILICON; SIMULATION;
D O I
10.1038/s41598-022-12673-9
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
To improve the detection efficiency of the structured scintillation screen with CsI(Tl) micro-square-frustums based on oxidized Si micropore array template in the case of a period as small as microns, the influence of Si wall thickness of the CsI(Tl) micro-square-frustums on the performance of the structured screen in X-ray imaging was investigated. The results show that when CsI(Tl) at the bottom of the screen is structured, the detective quantum efficiency (DQE) improves at almost all spatial frequency as the top thickness of the Si wall t(Si) decreases. However, when CsI (Tl) at the bottom of the screen is not structured, the DQE becomes better at low-frequency and worse at high-frequency as t(Si) decreases. The results can provide guidance for optimizing t(Si) according to the comprehensive requirements of detection efficiency and spatial resolution in X-ray imaging.
引用
收藏
页数:9
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