Structural stability and oxidation resistance of amorphous Zr-Al alloys

被引：15
|
作者：
Soroka, I. L. [1 ]
Vegelius, J. [2 ]
Korelis, P. T. [2 ]
Fallberg, A. [1 ]
Butorin, S. M. [2 ]
Hjorvarsson, B. [2 ]
机构：
[1] Uppsala Univ, Dept Chem Mat, SE-75121 Uppsala, Sweden
[2] Uppsala Univ, Dept Phys & Mat Sci, SE-75121 Uppsala, Sweden
来源：
JOURNAL OF NUCLEAR MATERIALS | 2010年 / 401卷 / 1-3期
基金：
瑞典研究理事会;
关键词：
CORROSION BEHAVIOR; ANODIC POLARIZATION; INITIAL OXIDATION; THIN-FILMS; ZIRCONIUM; GROWTH; XPS;
D O I：
10.1016/j.jnucmat.2010.03.016
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We investigated the structural stability and oxidation resistance of Zr-Al films upon annealing in air. The concentration of Zr was varied from 0 to 100 at.%, with a step of 10 at.%. The films were fabricated using ultra-high vacuum based magnetron sputtering. The as-deposited films with Zr content from 17.3 at.% to 70.7 at.% were found to be X-ray amorphous at room temperature. When exposed to air a thin oxide layer, typically less than 6 nm, is formed. The thickness of the oxide layers increases when the samples are annealed in air and most of these are found to be fully oxidized at 700 degrees C with the formation of crystalline and amorphous oxides on the top of crystalline and amorphous metal films, respectively. The amorphous oxide layers are found to be dense, with well defined thicknesses. An experimental non-equilibrium phase diagram is provided, covering the whole concentration range of the Zr-Al system. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：38 / 45
页数：8
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