Metal thin film ablation with femtosecond pulsed laser

被引:103
|
作者
Kim, Jaegu
Na, Suckjoo
机构
[1] Korea Inst Machinery & Mat, Taejon 305343, South Korea
[2] Korea Adv Inst Sci & Technol, Taejon 305701, South Korea
来源
OPTICS AND LASER TECHNOLOGY | 2007年 / 39卷 / 07期
关键词
femtosecond pulsed laser; laser ablation; thin film;
D O I
10.1016/j.optlastec.2006.10.001
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Micromachining thin metal films coated on glass are widely used to repair semiconductor masks and to fabricate optoelectrical and MEMS devices. The interaction of lasers and materials must be understood in order to achieve efficient micromachining. This work investigates the morphology of thin metal films after machining with femtosecond laser ablation using about 1 mu m diameter laser beam. The effect of the film thickness on the results is analyzed by comparing experimental images with data obtained using a two-temperature heat transfer model. The experiment was conducted using a high numerical aperture objective lens and a temporal pulse width of 220 fs on 200- and 500-nm-thick chromium films. The resulting surface morphology after machining was due to the thermal incubation effect, low thermal diffusivity of the glass substrate, and thermodynamic flow of the metal induced by volumetric evaporation. A Fraunhofer diffraction pattern was found in the 500-nm-thick film, and a ripple parallel to the direction of the laser light was observed after a few multiple laser shots. These results are useful for applications requiring micro- or nano-sized machining. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1443 / 1448
页数:6
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