NANOFABRICATION TOWARD HIGH-RESOLUTION AND LARGE AREA

被引：1

作者：

Qiao, Wen ^{[1
,2
,3
,4
]}

Pu, Donglin ^{[1
,2
,3
,4
,6
]}

Chen, Lin-Sen ^{[1
,2
,3
,4
,5
]}

机构：

[1] Soochow Univ, Sch Optoelect Sci & Engn, Suzhou 215006, Peoples R China

[2] Soochow Univ, Collaborat Innovat Ctr Suzhou Nano Sci & Technol, Suzhou 215006, Peoples R China

[3] Soochow Univ, Key Lab Adv Opt Mfg Technol Jiangsu Prov, Educ Minist China, Suzhou 215006, Peoples R China

[4] Soochow Univ, Key Lab Modern Opt Technol, Educ Minist China, Suzhou 215006, Peoples R China

[5] SVG Optron Co Ltd, Suzhou 215026, Peoples R China

[6] Key Lab Flexible Optoelect & Mfg Technol Jiangsu, Suzhou 215026, Peoples R China

来源：

2021 34TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2021) | 2021年

关键词：

photolithography; interference lithography; laser direct writing; nanofabrication; DIFFRACTIVE OPTICAL-ELEMENTS; LASER; FABRICATION; DISPLAY; SENSOR;

D O I：

10.1109/MEMS51782.2021.9375398

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Motivated by the huge demands for large scale photonic structures, micro-/nanofabrication technologies, especially laser direct writing (LDW) technologies, have made great progress in the past few years in the aspect of resolution, scalability, and fabrication throughput. This review will provide a comprehensive study on the research progress and latest achievements of LDW. Moreover, the patterning solutions with the feature of high resolution and large area for 2.5D structures, and periodic structures will be discussed, respectively. Finally, an outlook on the possible future directions of LDW methods will be proposed.

引用

页码：42 / 46

页数：5

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