X-ray emission spectroscopy and X-ray reflectometry of an Mo-Si periodic multilayer stackingf

被引：5
|
作者：
Jonnard, P
André, JM
Gautier, J
Roulliay, M
Bridou, F
Delmotte, F
Ravet, MF
机构：
[1] Univ Paris 06, Lab Chim Phys Mat & Rayonnement, UMR 7614, CNRS, F-75231 Paris 05, France
[2] CNRS, Grp Phys Films Minces, Lab Charles Fabry, CNRS,UMR 8501,Ctr Sci,Inst Opt, F-91403 Orsay, France
来源：
JOURNAL DE PHYSIQUE IV | 2004年 / 118卷
关键词：
D O I：
10.1051/jp4:2004118027
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：231 / 236
页数：6
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