Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating

被引：59
|
作者：
Li, MS [1 ]
Wang, FH [1 ]
机构：
[1] Chinese Acad Sci, Met Res Inst, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
来源：
SURFACE & COATINGS TECHNOLOGY | 2003年 / 167卷 / 2-3期
关键词：
arc ion plating; (Ti; Al)N coatings; N-2 partial pressure; pulse bias voltage;
D O I：
10.1016/S0257-8972(02)00895-2
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
By virtue of the characteristics of arc ion plating (AIP) technique, the structure and composition of (Ti,Al)N coatings can be tailored by controlling N-2 partial pressure and substrate bias. In this study, (Ti,Al)N coatings were deposited on 1Crl 1Ni2W2MoV stainless steel by AIR The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, elemental composition and phase structure of the coatings were investigated. (C) 2002 Published by Elsevier Science B.V.
引用
收藏
页码：197 / 202
页数：6
相关论文
共 50 条
  • [41] Effect of bias voltage on microstructure and mechanical properties of arc evaporated (Ti, Al)N hard coatings
    Aliaj, F.
    Syla, N.
    Avdiaj, S.
    Dilo, T.
    BULLETIN OF MATERIALS SCIENCE, 2013, 36 (03) : 429 - 435
  • [42] Effect of bias voltage on microstructure and mechanical properties of arc evaporated (Ti, Al)N hard coatings
    F ALIAJ
    N SYLA
    S AVDIAJ
    T DILO
    Bulletin of Materials Science, 2013, 36 : 429 - 435
  • [43] Effect of pulse bias voltage and nitrogen pressure on nitrogen distribution in steel substrate by plasma immersion ion implantation of nitrogen
    Mitsuo, A
    Uchida, S
    Aizawa, T
    SURFACE & COATINGS TECHNOLOGY, 2004, 186 (1-2): : 196 - 199
  • [44] Effect of Pulse Width and Frequency of Bias DC Voltage on the Microstructure of Pure Cr Coatings by Magnetron Sputter Ion Plating
    Li Hongtao
    Jiang Bailing
    Niu Yi
    Yang Bo
    Cao Zheng
    RARE METAL MATERIALS AND ENGINEERING, 2012, 41 : 371 - 374
  • [45] Effect of Pulse Width and Frequency of Bias DC Voltage on the Microstructure of Pure Cr Coatings by Magnetron Sputter Ion Plating
    Li Hongtao
    稀有金属材料与工程, 2012, 41 (S1) : 371 - 374
  • [46] Effect of Pulse Width and Frequency of Bias DC Voltage on the Microstructure of Pure Cr Coatings by Magnetron Sputter Ion Plating
    Li HongtaoJiang BailingNiu YiYang BoCao Zheng School of Materials Science and EngineeringXian University of TechnologyJinhua Road Xian China
    稀有金属材料与工程, 2012, 41(S1) (S1) : 371 - 374
  • [47] Effect of nitrogen pressure, bias voltage and substrate temperature on the phase structure of Mo-N coatings produced by cathodic arc PVD
    Kazmanli, MK
    Ürgen, M
    Cakir, AF
    SURFACE & COATINGS TECHNOLOGY, 2003, 167 (01): : 77 - 82
  • [48] Investigation of (Ti:N)-DLC coatings prepared by ion source assisted cathodic arc ion-plating with varying Ti target currents
    Cai, Y.
    Wang, R. Y.
    Liu, H. D.
    Luo, C.
    Wan, Q.
    Liu, Y.
    Chen, H.
    Chen, Y. M.
    Mei, Q. S.
    Yang, B.
    DIAMOND AND RELATED MATERIALS, 2016, 69 : 183 - 190
  • [49] Effects of Substrate Pulse Bias Duty Cycle on the Microstructure and Mechanical Properties of Ti-Cu-N Films Deposited by Magnetic Field-Enhanced Arc Ion Plating
    Zhao, Sheng-Sheng
    Zhao, Yan-Hui
    Cheng, Lv-Sha
    Denisov, Vladimir Viktorovich
    Koval, Nikolay Nikolaevich
    Yu, Bao-Hai
    Mei, Hai-Juan
    ACTA METALLURGICA SINICA-ENGLISH LETTERS, 2017, 30 (02) : 176 - 184
  • [50] Influence of the negative bias in ion plating on the microstructural and tribological performances of Ti-Si-N coatings in seawater
    Yao, Yirong
    Li, Jinlong
    Wang, Yongxin
    Ye, Yuwei
    Zhu, Lihui
    SURFACE & COATINGS TECHNOLOGY, 2015, 280 : 154 - 162
12345