Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating

被引：59
|
作者：
Li, MS [1 ]
Wang, FH [1 ]
机构：
[1] Chinese Acad Sci, Met Res Inst, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
来源：
SURFACE & COATINGS TECHNOLOGY | 2003年 / 167卷 / 2-3期
关键词：
arc ion plating; (Ti; Al)N coatings; N-2 partial pressure; pulse bias voltage;
D O I：
10.1016/S0257-8972(02)00895-2
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
By virtue of the characteristics of arc ion plating (AIP) technique, the structure and composition of (Ti,Al)N coatings can be tailored by controlling N-2 partial pressure and substrate bias. In this study, (Ti,Al)N coatings were deposited on 1Crl 1Ni2W2MoV stainless steel by AIR The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, elemental composition and phase structure of the coatings were investigated. (C) 2002 Published by Elsevier Science B.V.
引用
收藏
页码：197 / 202
页数：6
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