Monolithic active pixel detector realized in silicon on insulator technology

被引:16
|
作者
Bulgheroni, A
Caccia, M
Domanski, K
Grabiec, P
Grodner, M
Jaroszewicz, B
Klatka, T
Kociubinski, A
Koziel, M
Kucewicz, W
Kucharski, K
Kuta, S
Marczewski, J
Niemiec, H
Sapor, M
Szelezniak, M
Tomaszewski, D
机构
[1] AGH Univ Sci & Technol, PL-30059 Krakow, Poland
[2] Inst Electr Mat Technol, Warsaw, Poland
[3] Univ Insubria, Dip Sci, Como, Italy
关键词
position silicon detector; pixel detector;
D O I
10.1016/j.nima.2004.07.160
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The paper concerns the development of a novel monolithic silicon pixel detector, which exploits Silicon on Insulator substrates for the integration of the readout electronics and pixel detector. In the discussed solution, the readout CMOS circuit is manufactured in the thin device layer over the buried oxide while the pixel matrix is created in the high resistive handle wafer of the Sol substrate. Small test matrices of the Sol sensor have been recently manufactured and preliminary tests with an infrared laser light and a radioactive source indicated the sensor sensitivity for the ionizing radiation. The concept and design of the Sol detector together with the preliminary measurement results of the sensor matrices are addressed in the paper. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:398 / 403
页数:6
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