Patterning of nanoparticulate transparent conductive ITO films using UV light irradiation and UV laser beam writing

被引：23

作者：

Solieman, A. ^{[1
]}

Moharram, A. H. ^{[2
]}

Aegerter, M. A. ^{[3
]}

机构：

[1] Al Azhar Univ, Fac Sci, Dept Phys, Assiut Branch, Cairo, Egypt

[2] Assiut Univ, Fac Sci, Dept Phys, Assiut, Egypt

[3] Univ Saarland, INM, Coating Technol Dept, Saarland, Germany

来源：

APPLIED SURFACE SCIENCE | 2010年 / 256卷 / 06期

关键词：

Patterning; UV light irradiation; UV laser beam writing; Nanoparticles; ITO film; OXIDE THIN-FILMS; COATINGS; LITHOGRAPHY; DEPOSITION; ABLATION;

D O I：

10.1016/j.apsusc.2009.10.039

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Indium tin oxide (ITO) thin film is one of the most widely used as transparent conductive electrodes in all forms of flat panel display (FPD) and microelectronic devices. Suspension of already crystalline conductive ITO nanoparticles fully dispersed in alcohol was spun, after modifying with coupling agent, on glass substrates. The low cost, simple and versatile traditional photolithography process without complication of the photoresist layer was used for patterning ITO films. Using of UV light irradiation through mask and direct UV laser beam writing resulted in an accurate linear, sharp edge and very smooth patterns. Irradiated ITO film showed a high transparency (similar to 85%) in the visible region. The electrical sheet resistance decrease with increasing time of exposure to UV light and UV laser. Only 5 min UV light irradiation is enough to decrease the electrical sheet resistance down to 5 k Omega square. (C) 2009 Elsevier B. V. All rights reserved.

引用

页码：1925 / 1929

页数：5

共 50 条

[31] Patterning of graphene using wet etching with hypochlorite and UV light
Minfang Zhang
Mei Yang
Yuki Okigawa
Takatoshi Yamada
Hideaki Nakajima
Yoko Iizumi
Toshiya Okazaki
Scientific Reports, 12
[32] STUDY ON SYNTHESIS OF FILMS PRODUCED BY DIRECT UV LASER IRRADIATION
THOMANN, AL
BOULMERLEBORGNE, C
HERMANN, J
ANDREAZZAVIGNOLLE, C
ANDREAZZA, P
BLONDIAUX, G
DEGAS, F
ANNALES DE PHYSIQUE, 1994, 19 (05) : 175 - 176
[33] Microstructuring of cobalt (Co) thin films by UV laser irradiation
Itapu S.
Borra V.
Selvendran S.
Applied Physics A: Materials Science and Processing, 2023, 129 (12):
[34] Direct Patterning of Polystyrene-Polymethyl Methacrylate Copolymer by Means of Laser Interference Lithography Using UV Laser Irradiation
Lasagni, A. F.
Acevedo, D. F.
Barbero, C. A.
Muecklich, F.
POLYMER ENGINEERING AND SCIENCE, 2008, 48 (12): : 2367 - 2372
[35] An aqueous solution process and subsequent UV treatment for highly transparent conductive ZnO films
Wagata, Hajime
Ohashi, Naoki
Katsumata, Ken-ichi
Segawa, Hiroyo
Wada, Yoshiki
Yoshikawa, Hideki
Ueda, Shigenori
Okada, Kiyoshi
Matsushita, Nobuhiro
JOURNAL OF MATERIALS CHEMISTRY, 2012, 22 (38) : 20706 - 20712
[36] UV light emitting transparent conducting tin-doped indium oxide (ITO) nanowires
Gao, J.
Chen, R.
Li, D. H.
Jiang, L.
Ye, J. C.
Ma, X. C.
Chen, X. D.
Xiong, Q. H.
Sun, H. D.
Wu, T.
NANOTECHNOLOGY, 2011, 22 (19)
[37] Selective electrode patterning of ITO films using pulsed ultraviolet laser
Lin, H. K.
Hsu, W. C.
Tsao, L. C.
OPTICAL AND QUANTUM ELECTRONICS, 2016, 48 (02) : 1 - 11
[38] Selective electrode patterning of ITO films using pulsed ultraviolet laser
H. K. Lin
W. C. Hsu
L. C. Tsao
Optical and Quantum Electronics, 2016, 48
[39] Light Output Enhancement of Near UV-LED by Using Ti-Doped ITO Transparent Conducting Layer
Lin, Yung Hsun
Liu, Y. S.
Liu, C. Y.
IEEE PHOTONICS TECHNOLOGY LETTERS, 2010, 22 (19) : 1443 - 1445
[40] Direct Laser Writing of Nanosized Oligofluorene Truxenes in UV-Transparent Photoresist Microstructures
Kuehne, Alexander J. C.
Elfstrom, David
Mackintosh, Allan R.
Kanibolotsky, Alexander L.
Guilhabert, Benoit
Gu, Erdon
Perepichka, Igor F.
Skabara, Peter J.
Dawson, Martin D.
Pethrick, Richard A.
ADVANCED MATERIALS, 2009, 21 (07) : 781 - +

← 1 2 3 4 5 →