Performance of Multigate Single Electron Transistor in Wide Temperature Range and 22 nm Hybrid Technology

被引:4
|
作者
Jana, Biswabandhu [1 ]
Jana, Anindya [1 ]
Sing, Jamuna Kanta [2 ]
Sarkar, Subir Kumar [1 ]
机构
[1] Jadavpur Univ, Dept Elect & Telecommun Engn, Kolkata 700032, India
[2] Jadavpur Univ, Dept Comp Sci & Engn, Kolkata 700032, India
关键词
SET; Thermionic Emission; Room Temperature; 22; nm; TCAD; SIMON; CIRCUITS; DEVICES;
D O I
10.1166/jno.2014.1595
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reflects the performance improvement of single electron transistor considering multiple gates by solving master equation. We get the electrical characteristics using SIMON simulator at room temperature and show the thermionic contribution to the direct tunneling current at high temperature. To co integrate the SET logic with CMOS technology we have used the 22 nm node simulation tools. Simulation results show a good agreement. Finally, comparison of circuit's power consumption and delay analysis has been carried out between Hybrid MGSET-MOS and conventional technology. All the simulation is done in room temperature via 22-nm BSIM4 predictive model to realize the robustness and novelty of our presented model.
引用
收藏
页码:357 / 362
页数:6
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