Structure and infrared photoluminescence of GeSi nanocrystals formed by high temperature annealing of GeOx/SiO2 multilayers

Germanium and GeSi nanocrystals were synthesized in SiGeO2 glass by high temperature annealings of GeOx(5 nm)/SiO2(5 nm) multilayers. According to electron microscopy data, the size distribution and stoichiometry of the nanocrystals depend on the annealing temperature (700, 800, or 900 degrees C). Spatial redistribution of Ge with the formation of large faceted nanocrystals located near the Si substrate and GeSi intermixing at the substrate/film interface were observed. In the case of the 900 degrees C annealed sample, we note that some nanocrystals have a pyramid-like shape. Infrared absorption spectroscopy demonstrates that intermixing takes place between the GeOx and SiO2 layers leading to the formation of SiGeO2 glass. Raman spectroscopy confirms the formation of Ge nanocrystals after annealing at 700 degrees C and GeSi nanocrystals after annealing at 800 and 900 degrees C. For all annealed samples, we report the observation of infrared photoluminescence (PL) at low temperatures in the spectral range 1300-2100 nm. The observation of PL at wavelengths close to 2000 nm may be due to defect-induced radiative transitions in the nanocrystals.