Tungsten oxide nanorod growth by pulsed laser deposition: influence of substrate and process conditions

被引:13
|
作者
Huang, Peng [1 ]
Kalyar, M. Mazhar Ali [1 ]
Webster, Richard F. [2 ]
Cherns, David [2 ]
Ashfold, Michael N. R. [1 ]
机构
[1] Univ Bristol, Sch Chem, Bristol BS8 1TS, Avon, England
[2] Univ Bristol, Sch Phys, Bristol BS8 1TL, Avon, England
基金
英国工程与自然科学研究理事会; 美国国家科学基金会;
关键词
WO3; FILMS; EMISSION; PERFORMANCE; NANOTUBES; ARRAYS;
D O I
10.1039/c4nr03977g
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Tungsten oxide nanorods (NRs) have been grown on W, Ta and Cu substrates following 193 nm pulsed laser ablation of a WO3 target in a low background pressure of oxygen. The deposited materials were analysed by scanning and (high resolution) transmission electron microscopy (HRTEM), selected area electron diffraction (SAED), X-ray diffraction, Raman and X-ray photoemission spectroscopy, and tested for field emission. In each case, HRTEM analysis shows NR growth along the [100] direction, and clear stacking faults running along this direction (which are also revealed by streaking in the SAED pattern perpendicular to the growth axis). The NR composition in each case is thus determined as sub-stoichiometric WO3-delta, but the NR morphologies are very different. NRs grown on W or Ta are short (hundreds of nm in length) and have a uniform cross-section, whereas those grown on a Cu substrate are typically an order of magnitude larger, tapered, and display a branched, dendritic microstructure. Only these latter NRs give significant field emission.
引用
收藏
页码:13586 / 13597
页数:12
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