Sub-micron periodic structuring of sapphire by laser induced backside wet etching technique

被引:25
|
作者
Pissadakis, Stavros
Boehme, Rico
Zimmer, Klaus
机构
[1] Fdn Res & Technol Hellas, Inst Elect Struct & Laser, GR-71110 Iraklion, Greece
[2] Leibniz Inst Surface Modificat, D-04318 Leipzig, Germany
来源
OPTICS EXPRESS | 2007年 / 15卷 / 04期
关键词
D O I
10.1364/OE.15.001428
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The periodic structuring of sapphire, by using laser induced backside wet etching technique (LIBWE) and 266 nm, 150 ps Nd:YAG laser radiation, is demonstrated here for first time. Sub-micron period Bragg reflectors are successfully patterned in sapphire wafers using modest energy densities and number of pulses. The gratings are characterized using diffraction efficiency measurements, AFM, and SEM. Issues related to the ablation process and to the phase mask holography are presented and discussed. The experimental results presented depict that the applied method is capable to produce relief structures of depth as deep as 100 nm, while maintaining high resolutions, close to the thermal diffusion length of the material corresponding to the ultrashort pulse duration. (c) 2007 Optical Society of America.
引用
收藏
页码:1428 / 1433
页数:6
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