Characterization and control of surfaces and interfaces for III-V nanoelectronics

被引:5
|
作者
Hasegawa, H [1 ]
机构
[1] Hokkaido Univ, Res Ctr Integrated Quantum Elect, Sapporo, Hokkaido 060, Japan
[2] Hokkaido Univ, Grad Sch Elect & Informat Engn, Sapporo, Hokkaido 060, Japan
关键词
D O I
10.1002/pssa.200306306
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Recent progress and issues of characterization and control of surfaces and interfaces as related to III-V nanoelectronics are reviewed. After a brief general review of III-V nanotechnology, a novel hexagonal binary decision diagram (BDD) quantum logic circuit approach is introduced where hexagonal nanowire networks are controlled by nanoscale Schottky gates. For controlled formation of high-density nanostructures, selective molecular beam epitaxy growth is described together with a brief description of a cathodoluminescence-based characterization of buried heterointerfaces. As the key processing issue, problems associated with nanostructure surfaces and Schottky gates are discussed, introducing a recent scanned probe study and attempts to remove Fermi level pinning by a silicon interface control layer.
引用
收藏
页码:9 / 17
页数:9
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