Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma

被引：55

作者：

You, SJ ^{[1
]}

Bai, KH ^{[1
]}

In, JH ^{[1
]}

Chang, HY ^{[1
]}

Choi, CK ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 171卷 / 1-3期

关键词：

r.f; sheath; magnetic field; capacitive coupled plasma;

D O I：

10.1016/S0257-8972(03)00276-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We investigated r.f. sheath width variation in transversely magnetized capacitive coupled plasma. While increasing the magnetic field, a paradoxical sheath width variation was observed. Although the electron density decreases with increasing magnetic field, the r.f. sheath width (S-0 alpha1/rootn(e)) decreases with increasing magnetic field. This paradoxical result originates from the overlooking of the axial electron density profile variation by the magnetic field. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：226 / 230

页数：5

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