Simulation of plasma processes in plasma assisted CVD reactors

被引：0
|
作者：
Herrebout, D [1 ]
Bogaerts, A [1 ]
Goedheer, W [1 ]
Dekempeneer, E [1 ]
Gijbels, R [1 ]
机构：
[1] Univ Antwerp, Dept Chem, B-2610 Antwerp, Belgium
来源：
INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GASES, VOL IV, PROCEEDINGS | 1999年
关键词：
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
引用
收藏
页码：213 / 214
页数：2
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