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Ce0.70La0.20Ni0.10O2-δ catalyst for methane dry reforming: Influence of reduction temperature on the catalytic activity and stability
被引:70
|作者:
Pino, Lidia
[1
]
Italiano, Cristina
[1
]
Vita, Antonio
[1
]
Lagana, Massimo
[1
]
Recupero, Vincenzo
[1
]
机构:
[1] CNR, Ist Tecnol Avanzate Energia Nicola Giordano, Via S Lucia 5, I-98126 Messina, Italy
关键词:
Methane dry reforming;
Ni-lanthana-ceria solid solution;
Metal support interaction;
Catalyst stability;
RAY PHOTOELECTRON-SPECTROSCOPY;
METAL-SUPPORT INTERACTIONS;
CARBON-DIOXIDE;
SYNTHESIS GAS;
DIFFUSE-REFLECTANCE;
CHEMICAL CONVERSION;
NI/AL2O3;
CATALYST;
PARTIAL OXIDATION;
SYNGAS PRODUCTION;
NI;
D O I:
10.1016/j.apcatb.2017.06.080
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The influence of reduction temperature (450-900 degrees C) on the catalytic activity of Ce0.70La0.20Ni0.10O2-delta sample during methane dry reforming reaction to synthesis gas has been studied. The activity of the sample, prepared by combustion synthesis, has been evaluated at 750 degrees C under increasing gas hourly space velocity (from 26400 to 105600 h(-1)) for 50 h of stream. H-2-reduction of the sample at 450 degrees C induces, during reaction, large amount of carbon deposition (21-27%) that increases by increasing the gas hourly space velocity (GHSV), as revealed by TPO analysis on spent catalysts. Stable activity was revealed after reduction at 750 and 900 degrees C under a GHSV of 26400 h(-1). The catalytic activity of the reduced samples, by apparent specific activity, increases by increasing the Ni particles size and by increasing the fraction of Ni sites revealed by H-2-TPD peak at high temperature. The catalytic behavior has been discussed on the basis of the samples characterizations derived from X-ray diffraction, UV-vis diffuse reflectance spectroscopy, H-2-programmed reduction (TPR) and desorption (TPD), CO pulse chemisorption, X-ray photoelectron spectroscopy (XPS) and Scanning Electron Microscopy-Energy dispersive X-Ray (SEM/EDX). (C) 2017 Elsevier B.V. All rights reserved.
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页码:779 / 792
页数:14
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