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- [3] Doping effects from neutral B2H6 gas phase on plasma pretreated Si substrates as a possible process in plasma doping JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (6A): : 3903 - 3907
- [4] Doping effects from neutral B2H6 gas phase on plasma pretreated Si substrates as a possible process in plasma doping Tsutsui, K. (ktsutsui@ae.titech.ac.jp), 1600, Japan Society of Applied Physics (44):