Calculation of tunnel couplings in open gate-defined disordered quantum dot systems
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作者:
Klos, Jan
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Forschungszentrum Julich, JARA FIT Inst Quantum Informat, D-52074 Aachen, GermanyForschungszentrum Julich, JARA FIT Inst Quantum Informat, D-52074 Aachen, Germany
Klos, Jan
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Hassler, Fabian
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机构:Forschungszentrum Julich, JARA FIT Inst Quantum Informat, D-52074 Aachen, Germany
Hassler, Fabian
Cerfontaine, Pascal
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机构:Forschungszentrum Julich, JARA FIT Inst Quantum Informat, D-52074 Aachen, Germany
Cerfontaine, Pascal
Bluhm, Hendrik
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机构:Forschungszentrum Julich, JARA FIT Inst Quantum Informat, D-52074 Aachen, Germany
Bluhm, Hendrik
Schreiber, Lars R.
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机构:Forschungszentrum Julich, JARA FIT Inst Quantum Informat, D-52074 Aachen, Germany
Schreiber, Lars R.
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[1] Forschungszentrum Julich, JARA FIT Inst Quantum Informat, D-52074 Aachen, Germany
Quantum computation based on semiconductor electron-spin qubits requires high control of tunnel couplings between the quantum dots and the electron reservoirs. Potential disorder and the increasing complexity of the two-dimensional gate-defined quantum computing devices set high demands on the gate design and the voltage tuning of the tunnel barriers. We present a Green's formalism approach for the calculation of tunnel couplings between a quantum dot and a reservoir. Our method takes into account in full detail the two-dimensional electrostatic potential of the quantum dot, the tunnel barrier, and the reservoir. A wideb and limit is employed only far away from the tunnel barrier region where the density of states is sufficiently large. We calculate the tunnel coupling including potential disorder effects, which become increasingly important for large-scale silicon-based spin-qubit devices. Studying the tunnel couplings of a single-electron transistor in Si/SiGe as a showcase, we find that charged defects are the dominant source of disorder leading to variations in the tunnel coupling of four orders of magnitude.
机构:
Purdue Univ, Elmore Family Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USAPurdue Univ, Elmore Family Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
Metti, S.
Thomas, C.
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机构:
Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
Purdue Univ, Dept Phys & Astron, W Lafayette, IN 47907 USAPurdue Univ, Elmore Family Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
Thomas, C.
Manfra, M. J.
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机构:
Purdue Univ, Elmore Family Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
Purdue Univ, Dept Phys & Astron, W Lafayette, IN 47907 USA
Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Microsoft Quantum Lab West Lafayette, W Lafayette, IN 47907 USAPurdue Univ, Elmore Family Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
机构:
Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
Toshiba Res & Dev Ctr, Kawasaki, Kanagawa 2128582, JapanHarvard Univ, Dept Phys, Cambridge, MA 02138 USA
Nakaharai, S.
Williams, J. R.
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机构:
Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
Harvard Univ, Sch Engn & Appl Sci, Cambridge, MA 02138 USAHarvard Univ, Dept Phys, Cambridge, MA 02138 USA
Williams, J. R.
Marcus, C. M.
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Harvard Univ, Dept Phys, Cambridge, MA 02138 USAHarvard Univ, Dept Phys, Cambridge, MA 02138 USA