TAILORING SP2/SP3 RATIO IN DIAMOND-LIKE CARBON FILMS VIA DEPOSITION PARAMETERS IN A HIGH VOLTAGE ANODIC VACUUM PLASMA

被引：0

作者：

Badulescu, M. ^{[1
]}

Anghel, A. ^{[1
]}

Surdu-Bob, C. C. ^{[1
]}

Logofatu, C. ^{[2
]}

Luculescu, C. ^{[1
]}

机构：

[1] Natl Inst Lasers Plasma & Radiat Phys, POB MG 36, Bucharest 77125, Romania

[2] Natl Inst Mat Phys, POB MG 7, Bucharest 77125, Romania

来源：

ROMANIAN REPORTS IN PHYSICS | 2019年 / 71卷 / 04期

关键词：

diamond-like carbon thin films; Raman spectra; XPS spectra; sp(2)/sp(3) ratio; RAMAN-SPECTRA; SP(3) CONTENT; DLC FILMS; SP(2)/SP(3) RATIO; COATINGS; PHOTOEMISSION;

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Tailoring sp(2)/sp(3) ratio in diamond-like carbon thin films offers new surface engineering solutions for the continuously increasing devices requirements in various fields. We report here the control of sp(2)/sp(3) carbon content using the high voltage anodic plasma in vacuum. Correlation of data obtained by visible Raman Spectroscopy and XPS spectra of our DLC films with deposition parameters showed an increase in sp(3) bonding of about 10% when decreasing the discharge voltage from 600 V to 200 V or increasing the anode-substrate distance from 15 cm to 36 cm.

引用

页数：14

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