Effect of annealing on the tolerance of LiCaAlF6 single crystals against F2 laser irradiation

被引：0

作者：

Kawaguchi, Y

Narazaki, A

Sato, T

Kurosaki, R

Niino, H

Sato, H

Fukuda, T

机构：

[1] Natl Inst Adv Ind Sci & Technol, Photon Res Inst, Tsukuba, Ibaraki 3058565, Japan

[2] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Sendai, Miyagi 9808577, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 9A期

关键词：

LiCaAlF6; F-2; laser; vacuum ultraviolet light; transmittance; annealing; optical tolerance;

D O I：

10.1143/JJAP.43.6168

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The optical tolerance of annealed LiCaAlF6 single crystals against F-2 laser irradiation was investigated. Annealed LiCaAlF6 (t = 1.45 mm) shows, an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F-2 laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F-2 laser beam up to 10(5) pulses at a fluence of approximately 160 mj cm(-2) pulse(-1).

引用

页码：6168 / 6169

页数：2

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