Analysis of multimask fabrication errors for diffractive optical elements

被引:18
|
作者
Caley, Adam J.
Braun, Markus
Waddie, Andrew J.
Taghizadeh, Mohammad R.
机构
[1] Heriot Watt Univ, Sch Engn & Phys Sci, Edinburgh EH14 4AS, Midlothian, Scotland
[2] Fak Phys, D-76131 Karlsruhe, Germany
关键词
D O I
10.1364/AO.46.002180
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
As design algorithms for diffractive optical elements improve, the limiting factor becomes the fabrication process. It is hoped a better understanding of fabrication errors will allow elements with greater tolerance to be designed. This is important for high-power laser fiber coupling, where hot spots lead to failure. We model seven different fan-out gratings applying misetch, misalignment, and feature rounding. Our main findings are that misetch can lead to improved results, misalignment is strongly asymmetric, and both the pi and pi/2 masks can dominate misalignment. Rounding has a r(2) dependence and potentially can be incorporated into the design stage. Finally we present some experimental data for misalignment. (c) 2007 Optical Society of America.
引用
收藏
页码:2180 / 2188
页数:9
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