Effect of roughness and nanoporosity on optical properties of black and reflective Al films prepared by magnetron sputtering

被引:16
|
作者
Hruska, Petr [1 ,2 ]
More-Chevalier, Joris [1 ]
Novotny, Michal [1 ]
Cizek, Jakub [2 ]
Melikhova, Oksana [2 ]
Fekete, Ladislav [1 ]
Poupon, Morgane [1 ]
Bulir, Jiri [1 ]
Volfova, Lenka [1 ,3 ]
Butterling, Maik [4 ]
Liedke, Maciej Oskar [4 ]
Wagner, Andreas [4 ]
Fitl, Premysl [1 ,5 ]
机构
[1] Czech Acad Sci, Inst Phys, Slovance 2, Prague 18221, Czech Republic
[2] Charles Univ Prague, Fac Math & Phys, V Holesovickach 2, Prague 18000, Czech Republic
[3] Charles Univ Prague, Fac Sci, Albertov 6, Prague 12800, Czech Republic
[4] Helmholtz Zentrum Dresden Rossendorf, Inst Radiat Phys, Bautzner Landstr 400, D-01328 Dresden, Germany
[5] Univ Chem & Technol, Dept Phys & Measurements, Tech 5, Prague 16628, Czech Republic
关键词
Black aluminum; Magnetron sputtering; Atomic force microscopy; Spectrophotometric reflectance; Positron annihilation spectroscopy; POSITRON-ANNIHILATION; THIN-FILMS; NANOSCOPIC POROSITY; LIFETIME; METALS; MICROSTRUCTURE; DEPENDENCE; ABSORBERS; SURFACES;
D O I
10.1016/j.jallcom.2021.159744
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this work, a comparison of the microstructure of black and classic reflective aluminum films is provided. The N-2 concentration during the magnetron sputtering deposition has a key impact on the growth process and final moth-eye-like morphology of black Al films. The study of films with thickness similar to 1.5 mu m and similar to 8 mu m and fully developed microstructure enabled us to clarify the origin of different optical properties of black and reflective Al. Atomic force microscopy measurements showed high roughnesses for both types of films leading to light scattering from their surface. In the case of black Al, the incident light is absorbed in a fractal-like nanoporous surface. Less than 3% of the intensity in the wavelength range from 190 nm to 1200 nm is reflected. Positronium formation in columnar nanopores with a diameter of 4 - 5 angstrom was ob-served by positron annihilation lifetime spectroscopy. The nanoporosity rather than the roughness is the key feature of black films compared to reflective ones. (C) 2021 Elsevier B.V. All rights reserved.
引用
收藏
页数:9
相关论文
共 50 条
  • [41] Effect of annealing temperature on the structural and optical properties of ZnO thin films prepared by RF magnetron sputtering
    Daniel, Georgi P.
    Justinvictor, V. B.
    Nair, Prabitha B.
    Joy, K.
    Koshy, Peter
    Thomas, P. V.
    PHYSICA B-CONDENSED MATTER, 2010, 405 (07) : 1782 - 1786
  • [42] Oxygen amount effect on optical properties of aluminium oxide nanostructured films prepared by reactive magnetron sputtering
    Koushki, E.
    Mousavi, S. H.
    Baedi, J.
    OPTIK, 2016, 127 (11): : 4635 - 4638
  • [43] Effect of oxygen partial pressure on the optical and structural properties of Al doped ZnO thin films prepared by RF magnetron sputtering method
    Shin, Seung Wook
    Park, Hyeon Soo
    Moon, Jong-Ha
    Kim, The Won
    Kim, Jin Hyeok
    JOURNAL OF THE KOREAN INSTITUTE OF METALS AND MATERIALS, 2008, 46 (04): : 249 - 256
  • [44] Effect of substrate temperature on the structural and optical properties of ZnO and Al-doped ZnO thin films prepared by dc magnetron sputtering
    Li, Xue-Yong
    Li, Hong-Jian
    Wang, Zhi-Jun
    Xia, Hui
    Xiong, Zhi-Yong
    Wang, Jun-Xi
    Yang, Bing-Chu
    OPTICS COMMUNICATIONS, 2009, 282 (02) : 247 - 252
  • [45] Properties of ITO films prepared by rf magnetron sputtering
    El Akkad, F.
    Punnoose, A.
    Prabu, G.
    Applied Physics A: Materials Science and Processing, 2000, 71 (02): : 157 - 160
  • [46] Tribological properties of DLC films prepared by magnetron sputtering
    Wang Hong-mei
    Zhang Wei
    Yu He-long
    Liu Qing-liang
    PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING, 2011, 18
  • [47] Properties of ITO films prepared by reactive magnetron sputtering
    Kleinhempel, Ronny
    Kaune, Gunar
    Herrmann, Matthias
    Kupfer, Hartmut
    Hoyer, Walter
    Richter, Frank
    MICROCHIMICA ACTA, 2006, 156 (1-2) : 61 - 67
  • [48] Properties of carbon films prepared by magnetron sputtering of woodceramics
    Kasai, K
    Endo, H
    Shibata, K
    JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1999, 107 (08) : 748 - 751
  • [49] Properties of ITO films prepared by reactive magnetron sputtering
    Ronny Kleinhempel
    Gunar Kaune
    Matthias Herrmann
    Hartmut Kupfer
    Walter Hoyer
    Frank Richter
    Microchimica Acta, 2006, 156 : 61 - 67
  • [50] Structural and Optical Properties of Al-Zn-Cu Thin Films Prepared by DC-Magnetron Sputtering at Different Sputtering Powers
    Dejam, Laya
    Elahi, S. Mohammad
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2013, 577 (01) : 59 - 70