Picosecond-laser system for photomask repair with nanometer accuracy

被引：0
|
作者：
Togawa, T [1 ]
Ueda, A [1 ]
Morishige, Y [1 ]
Suzuki, Y [1 ]
机构：
[1] NEC Corp Ltd, NEC Networks, Control Syst Operat Unit, Laser Solut Div, Kanagawa 2291198, Japan
来源：
THIRD INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 4830卷
关键词：
solid-state laser; photomask repair; picosecond; mode-locking; ablation; ultra-violet;
D O I：
10.1117/12.486582
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A novel 351 am picosecond-range pulsed, master-oscillator-power amplifier laser system, specially designed for an advanced mask repairing system, LM700A, capable of repairing photomasks for 130 nm-design rule 1G DRAMs, has been developed. The front-end of the laser system is a diode-pumped, simultaneously active-mode-locked and Q-switched Nd:YLF laser and is capable of emitting short light pulses variable in the range between several ten- and several hundred picosecond. Extracted pulses from the mode-locked and Q-switched pulse trains are amplified by a double-pass amplifier and are subsequently frequency-converted to 351 nm by using LBO crystals for high-precision photomask repairing. Optimum irradiation conditions for opaque defect repairing have been investigated for by varying pulse duration to satisfy the stringent requirements such as for minimum repairing accuracy better than 30 nm, high transmission with minimum surface damage, minimum wall roll-up, etc. Mid-range pulses having around 200 ps have been found to be optimum to realize high quality repairing.
引用
收藏
页码：346 / 351
页数：6
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