Rapid thermal processing: A comprehensive classification of silicon materials

被引:8
|
作者
Peters, S [1 ]
Lee, JY [1 ]
Ballif, C [1 ]
Borchert, D [1 ]
Glunz, SW [1 ]
Warta, W [1 ]
Willeke, G [1 ]
机构
[1] Fraunhofer ISE, Lab & Serv Ctr, D-45884 Gelsenkirchen, Germany
关键词
D O I
10.1109/PVSC.2002.1190494
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Depending on the specific impurities and defect spectrum of a silicon material, the minority carrier lifetime can react diversely to Rapid Thermal Processing (RTP). We have measured the lifetime of silicon materials before and after RTP and have diffused solar cells either by RTP or by conventional quartz tube furnace processing (CFP). Our investigations show that the lifetime of Fz-Si can be preserved during RTP resulting in up to 18.7% efficient solar cells. For 1.4 Omegacm PV-grade Cz-Si, the stable lifetime after light degradation could be improved by up to 60% by RTP. In the case of EFG-Si, the same average cell efficiency was obtained with RTP diffusion as with the industrial reference diffusion process. However, in the case of block-cast mc-Si, the lifetime decreases with increasing diffusion temperature indicating that P-diffusion in the second range might provide insufficient gettering.
引用
收藏
页码:214 / 217
页数:4
相关论文
共 50 条
  • [1] Rapid thermal processing of magnetic materials
    Jin, Z. Q.
    Liu, J. P.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (14) : R227 - R244
  • [2] Novel heaters for thermal processing - (including rapid thermal processing of silicon)
    Sekhar, JA
    Penumella, S
    Fu, M
    [J]. TRANSIENT THERMAL PROCESSING TECHNIQUES IN ELECTRONIC MATERIALS, 1996, : 171 - 175
  • [3] Rapid Thermal Processing and the engineering of intrinsic point defect profiles and silicon materials properties
    Falster, R
    [J]. RAPID THERMAL AND OTHER SHORT-TIME PROCESSING TECHNOLOGIES III, PROCEEDINGS, 2002, 2002 (11): : 3 - 10
  • [4] Rapid thermal annealing issues in silicon processing
    Fair, RB
    [J]. TRANSIENT THERMAL PROCESSING TECHNIQUES IN ELECTRONIC MATERIALS, 1996, : 61 - 66
  • [5] Silicon rapid thermal processing with ripple pyrometry
    Fiory, AT
    [J]. IN SITU PROCESS DIAGNOSTICS AND INTELLIGENT MATERIALS PROCESSING, 1998, 502 : 105 - 115
  • [6] Rapid thermal processing for silicon nanoelectronics applications
    Fiory, AT
    [J]. JOM, 2005, 57 (06) : 21 - 26
  • [7] Rapid thermal processing for silicon nanoelectronics applications
    A. T. Fiory
    [J]. JOM, 2005, 57 : 21 - 26
  • [8] EFFECTS OF RAPID THERMAL-PROCESSING ON THERMAL OXIDES OF SILICON
    LEE, SK
    KWONG, DL
    ALVI, NS
    [J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) : 3360 - 3363
  • [9] A rapid thermal processing system for the deposition of silicon carbide layers on silicon
    Montgomery, JH
    Ruddell, FH
    McNeill, DW
    Armstrong, BM
    Gamble, HS
    [J]. INTERNATIONAL JOURNAL OF MATERIALS & PRODUCT TECHNOLOGY, 1996, 11 (1-2): : 166 - 177
  • [10] THE DOPING OF SILICON WITH BORON BY RAPID THERMAL-PROCESSING
    DESOUZA, JP
    HASENACK, CM
    SWART, JE
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (04) : 277 - 280