In-plane and out-of-plane dielectric constant measurement techniques for sub-micron MOS devices

被引:0
|
作者
Tee, CC [1 ]
Sarkar, G [1 ]
Meng, SCY [1 ]
Yu, DLH [1 ]
Chan, L [1 ]
机构
[1] Nanyang Technol Univ, Sch Appl Sci, Singapore 639798, Singapore
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper focuses on the techniques adopted to carefully characterize the dielectric constant of low k SOG (spin-on-glass), both for in-plane and out-of-plane measurements. In the case of out-of-plane dielectric constant measurement, the capacitance-voltage (C-V) sweep is utilised to measure the SOG capacitance. For in-plane dielectric constant measurement, intra capacitors are required and a novel technique of extracting coupling capacitance is presented. SOG A has a measured out-of-plane dielectric constant of 2.518+/-0.033. SOG B has measured in-plane dielectric constant of 4.86.
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页码:86 / 89
页数:4
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