Effect of Substrate Orientation on Structural and Magnetic Properties of BiMnO3 Thin Films by RF Magnetron Sputtering

被引：3
|
作者：
Pugazhvadivu, K. S. [1 ]
Tamilarasan, K. [1 ]
Saravanakumar, K. [2 ]
Ganesan, V. [3 ]
机构：
[1] Kongu Engn Coll, Deartment Phys, Thin Film Res Ctr, Perundurai 638052, India
[2] Kongunadu Arts & Sci Coll, Dept Phys, Coimbatore 641029, Tamil Nadu, India
[3] UGC DAE, Consortium Sci Res, Indore 452017, Madhya Pradesh, India
来源：
BRNS, AICTE, DST, CSIR AND ISRO SPONSORED NATIONAL CONFERENCE ON SPINTRONIC MATERIALS: NANOSTRUCTURES AND DEVICES (SMND-2011) | 2013年 / 49卷
关键词：
Thin films; BiMnO3; Sputtering; Multiferroic; Ferromagnetism;
D O I：
10.1016/j.phpro.2013.10.025
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Bismuth manganese oxide (BiMnO3) thin films were grown on Si (100) and Si (111) substrates by RF magnetron sputtering. The properties of grown films were analyzed by X-ray diffraction (XRD), Energy dispersive analysis of X-ray Spectrum (EDX), Atomic force microscopy (AFM) and Vibrating sample magnetometer (VSM). The XRD result reveals that BiMnO3 (BMO) thin films on both the substrates are polycrystalline in nature with monoclinic structure, however the films on Si (100) showed better crystalline quality than those deposited on Si (111). It has been observed from the room temperature VSM studies that BMO / Si (100) system has high saturation magnetization of 3.7 x 10(-4) emu/cm(3) compared to the BMO / Si (111). (C) 2013 The Authors. Published by Elsevier B.V.
引用
收藏
页码：183 / 189
页数：7
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