Maskless pattern fabrication on Pyrex 7740 glass surface by using nano-scratch with HF wet etching

被引：18
|
作者：
Youn, SW
Kang, CG
机构：
[1] Pusan Natl Univ, Dept Precis & Mech Engn, Pusan 609735, South Korea
[2] Pusan Natl Univ, Sch Mech Engn, Pusan 609735, South Korea
来源：
SCRIPTA MATERIALIA | 2005年 / 52卷 / 02期
基金：
新加坡国家研究基金会;
关键词：
lithography; nano-scratch test; silicate;
D O I：
10.1016/j.scriptamat.2004.09.016
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Line patterns were machined on borosilicate (Pyrex 7740 glass) surface using the combination of mechanical machining by Nanoindenter(R) XP and HF wet etching, and a etch-mask effect of the affected layer of the nano-scratched Pyrex 7740 glass surface was investigated. (C) 2004 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：117 / 122
页数：6
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