On the mechanism of electrical conduction in plasma polymerized furan films

被引：10
|
作者：
Kumar, DS [1 ]
机构：
[1] CMS Coll, Dept Phys, George Sudarshan Ctr Phys & Comp Sci, Kottayam 686001, Kerala, India
来源：
JOURNAL OF MATERIALS SCIENCE | 2000年 / 35卷 / 17期
关键词：
D O I：
10.1023/A:1004873410933
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Dark conduction in radio frequency plasma polymerized Furan thin film is reported. A contact limited Schottky mechanism is found to predominate. A comparison of the value from different experimental studies and the value from theoretical studies confirm the Schottky type mechanism in Furan thin film. (C) 2000 Kluwer Academic Publishers.
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页码：4427 / 4430
页数：4
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