Newly developed mask inspection system with DUV laser illumination

被引：9
|
作者：
Oohashi, K [1 ]
Inoue, H [1 ]
Nomura, T [1 ]
Ono, A [1 ]
Tabata, M [1 ]
Suzuki, H [1 ]
机构：
[1] Toshiba Corp, Corp Mfg Engn Ctr, Isogo Ku, Yokohama, Kanagawa 2350017, Japan
来源：
PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VII | 2000年 / 4066卷
关键词：
DUV laser; laser illumination; speckle noise; phase plate;
D O I：
10.1117/12.392086
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A new mask inspection system for 150nm and 130nm semiconductor devices which utilizes a DUV laser of 257nm wavelength for an inspection illumination has been developed. A newly developed optical phase shift disk cancels the speckle noise caused by the high coherency of a laser. The phase shift disk has micro pits with different depths disposed randomly over the entire plate surface. The speckle pattern changes randomly by rotating the plate, and averaging pattern image by Time Delay Integration (TDI) sensor cancels the speckle noise of the laser illumination. Using this method, inspection of masks was realized at DUV wavelength.
引用
收藏
页码：452 / 461
页数：10
相关论文
共 50 条
  • [21] HIGH RELIABLE MASK INSPECTION SYSTEM
    TSUJIYAMA, B
    SAITO, K
    KURIHARA, K
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (08) : C352 - C352
  • [22] A HIGHLY RELIABLE MASK INSPECTION SYSTEM
    TSUJIYAMA, B
    SAITO, K
    KURIHARA, K
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (07) : 1284 - 1290
  • [23] Productivity of Femtosecond DUV Laser Photomask Repair in a Real World Mask House
    Lin, Jiin-Hong
    Chen, C. Y.
    Tsai, F. G.
    Robinson, Tod
    Yi, Daniel
    LeClaire, Jeff
    White, Roy
    Bozak, Ron
    Archuletta, Mike
    [J]. PHOTOMASK TECHNOLOGY 2011, 2011, 8166
  • [24] AN AUTOMATED MASK DEFECT INSPECTION SYSTEM
    TSUJIYAMA, B
    KURIHARA, K
    SAITO, K
    [J]. REVIEW OF THE ELECTRICAL COMMUNICATIONS LABORATORIES, 1982, 30 (06): : 1076 - 1085
  • [25] AUTOMATIC MASK AND RETICLE INSPECTION SYSTEM
    YANG, H
    [J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 334 : 216 - 218
  • [26] Advanced femtosecond DUV laser mask repair tool for large area photomasks
    Treyger, Leon
    Heyl, Jon
    Fink, Michael
    Koren, Iztok
    Li, Yonggang
    Ronning, Donald
    Small, Farrell
    Xian, Bin
    [J]. PHOTOMASK TECHNOLOGY 2006, PTS 1 AND 2, 2006, 6349
  • [27] High Sensitivity Surface Defect Inspection of SiC and SmartSiCTM Substrates Using a DUV Laser-Based System
    Cela, Enrica
    Shahidi, Sam
    Parangi, Prasant
    Shrestha, Ramesh
    Simpson, Gavin
    Widiez, Julie
    Daval, Nicolas
    Chapelle, Audrey
    Rouchier, Séverin
    Schwarzenbach, Walter
    [J]. Defect and Diffusion Forum, 2023, 425 : 37 - 61
  • [28] Extending inspection limits using a DUV-laser-based bright-field inspection tool
    Raccah, Nurit
    Rogers, Daniel
    Tzuri, Ehud
    Shavit, Arik
    [J]. MICRO, 2005, 23 (06): : 55 - +
  • [29] POTENTIAL USE OF NEWLY DEVELOPED HIGHWAY BRIDGE INSPECTION DEVICES
    MCGOGNEY, C
    [J]. MATERIALS EVALUATION, 1985, 43 (02) : 12 - 13
  • [30] Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly
    Hashimoto, Hideaki
    Kikuiri, Nobutaka
    Matsumoto, Eiji
    Tsuchiya, Hideo
    Ogawa, Riki
    Isomura, Ikunao
    Isobe, Manabu
    Takahara, Kenichi
    [J]. PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XX, 2013, 8701
12345