High-resolution lenses for sub-100 nm x-ray fluorescence microscopy

被引:40
|
作者
David, C [1 ]
Kaulich, B
Barrett, R
Salomé, M
Susini, J
机构
[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[2] European Synchrotron Radiat Facil, F-38043 Grenoble, France
关键词
D O I
10.1063/1.1329638
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the design, fabrication, and testing of Fresnel zone plates for high-resolution x-ray fluorescence microscopy using the scanning x-ray microscope at the European Synchrotron Radiation Source. The germanium lenses were optimized for operation near the sulphur absorption edge at 2472 eV photon energy. The high measured diffraction efficiencies of up to 9.6% and the good match to the spatial coherence of the undulator beam resulted in a photon flux of about 4x10(8) photons per second within the bandwidth of a silicon < 111 > monochromator. Using a test object consisting of zinc sulphide nanostructures, we were able to image features in sulphur x-ray fluorescence mode with lateral dimensions down to below 100 nm. (C) 2000 American Institute of Physics. [S0003-6951(00)01149-9].
引用
收藏
页码:3851 / 3853
页数:3
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