Gate-Tunable Graphene-WSe2 Heterojunctions at the Schottky-Mott Limit

被引:67
|
作者
LaGasse, Samuel W. [1 ,2 ]
Dhakras, Prathamesh [1 ,2 ]
Watanabe, Kenji [3 ]
Taniguchi, Takashi [3 ]
Lee, Ji Ung [1 ,2 ]
机构
[1] SUNY Albany, Polytech Inst, Coll Nanoscale, Albany, NY 12203 USA
[2] SUNY Albany, Polytech Inst, Coll Sci & Engn, Albany, NY 12203 USA
[3] Natl Inst Mat Sci, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan
基金
美国国家科学基金会;
关键词
2D materials; Fermi level pinning; graphene; Schottky junctions; Schottky-Mott limit; van der Waals heterostructures; HETEROSTRUCTURE; TRANSPORT; MOBILITY; DEVICE;
D O I
10.1002/adma.201901392
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Metal-semiconductor interfaces, known as Schottky junctions, have long been hindered by defects and impurities. Such imperfections dominate the electrical characteristics of the junction by pinning the metal Fermi energy. Here, a graphene-WSe2 p-type Schottky junction, which exhibits a lack of Fermi level pinning, is studied. The Schottky junction displays near-ideal diode characteristics with large gate tunability and small leakage currents. Using a gate electrostatically coupled to the WSe2 channel to tune the Schottky barrier height, the Schottky-Mott limit is probed in a single device. As a special manifestation of the tunable Schottky barrier, a diode with a dynamically controlled ideality factor is demonstrated.
引用
收藏
页数:5
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