Compact modeling of high-frequency distortion in silicon integrated bipolas transistors

被引:23
|
作者
Schröter, M
Pehlke, DR
Lee, TY
机构
[1] Conexant Syst Inc, Newport Beach, CA USA
[2] Ericsson Telecom Div, Res Triangle Pk, NC 27709 USA
关键词
bipolar transistors; compact modeling; distortion; high-frequency;
D O I
10.1109/16.848303
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The high-frequency distortion behavior of integrated silicon bipolar transistors is investigated experimentally and theoretically, Single-tone measurements using an automated setup are performed on transistors with various sizes and of different type, that were fabricated in a state-of-the-art production process offering high-speed and high-voltage transistor versions. The measured data, which were taken on devices laid out in usual high-frequency test pads, are compared to the advanced compact model HICUM showing excellent agreement over input power, bias, and frequency. In addition, a simplified model is used together with a Volterra-series approach to identify the nonlinear effects that are most important at high frequencies.
引用
收藏
页码:1529 / 1535
页数:7
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