Growth and properties of large-area sulfur-doped graphene films

被引:25
|
作者
Zhou, Jinhao [1 ]
Wang, Zegao [1 ,2 ]
Chen, Yuanfu [1 ]
Liu, Jingbo [3 ]
Zheng, Binjie [1 ]
Zhan, Wanli [1 ]
Li, Yanrong [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China
[2] Aarhus Univ, Interdisciplinary Nanosci Ctr iNANO, DK-8000 Aarhus C, Denmark
[3] Cent Acad Dongfang Elect Corp, Energy Convers R&D Ctr, Chengdu 611731, Sichuan, Peoples R China
基金
中国国家自然科学基金; 国家高技术研究发展计划(863计划);
关键词
CHEMICAL-VAPOR-DEPOSITION; LOW-TEMPERATURE GROWTH; ELECTRICAL-PROPERTIES; RAMAN-SPECTROSCOPY; CARBON NANOTUBES; NITROGEN; ELECTROCATALYST; NANOSHEETS; GRAPHITE; CATALYST;
D O I
10.1039/c7tc00447h
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Heteroatom doping can effectively tune the structure and properties of graphene. Theoretical calculations indicate that sulfur doping can effectively modify the band structure and further modulate the carrier transport properties of graphene. However, it is still a big challenge to synthesize large-area sulfur-doped graphene (SG) films with a high sulfur doping concentration and reasonable electrical properties since sulfur has a much larger atomic radius than carbon. In this study, the solid organic source thianthrene (C12H8S2) is employed as both a carbon source and sulfur dopant to grow large-area, few-layered SG films via chemical vapor deposition (CVD). The results show that the doping concentration, doping configuration and electrical properties can be effectively tuned via the hydrogen flux. The sulfur doping concentration is as high as 4.01 at% and the maximal mobility of SG can reach up to 270 cm(2) V-1 s(-1), which are the highest ever reported for sulfur-doped graphene.
引用
收藏
页码:7944 / 7949
页数:6
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