pentacene;
channel length;
channel width;
ITO;
field effect mobility;
D O I:
10.1143/JJAP.43.7718
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
We fabricated pentacene thin film-transistors on a glass substrate with a SiO2 layer via thermal evaporation in ultrahigh vacuum. We investigated the influence of channel length, channel width, and the deposition rate of a pentacene layer on organic thin film transistors (OTFTs) performance. Field-effect mobility of the transistors markedly increased as channel width decreased and channel length increased. The maximum drain current of OTFTs increased as channel length decreased. These observations indicate that the grain boundary scattering of charge carriers in the pentacene layer is a major hurdle in charge conduction, similarly to the observation in poly-Si TFTs. The maximum field-effect mobility was 0.69 cm(2)/Vs for a device prepared at 0.1 Angstrom/s with a 50 mum channel length and a 20 mum channel width. Channel width/length ratio (W/L) as well as the deposition rate of the pentacene layer should be carefully chosen to increase field-effect mobility and maximum drain current in OTFTs.
机构:
Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China
Han, Chuan Yu
Qian, Ling Xuan
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机构:
Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China
Qian, Ling Xuan
Leung, Cheung Hoi
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机构:
Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China
Leung, Cheung Hoi
Che, Chi Ming
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机构:
Univ Hong Kong, Dept Chem, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China
Che, Chi Ming
Lai, P. T.
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机构:
Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China
机构:
Elect & Telecommun Res Inst, IT Convergence & Components Lab, Taejon 305700, South KoreaElect & Telecommun Res Inst, IT Convergence & Components Lab, Taejon 305700, South Korea
Koo, Jae Bon
Ku, Chan Hoe
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机构:Elect & Telecommun Res Inst, IT Convergence & Components Lab, Taejon 305700, South Korea
Ku, Chan Hoe
Lim, Jung Wook
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机构:Elect & Telecommun Res Inst, IT Convergence & Components Lab, Taejon 305700, South Korea
Lim, Jung Wook
Kim, Seong Hyun
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机构:Elect & Telecommun Res Inst, IT Convergence & Components Lab, Taejon 305700, South Korea