Kinetics of excited states and radicals in a nanosecond pulse discharge and afterglow in nitrogen and air

被引:64
|
作者
Shkurenkov, Ivan [1 ,2 ]
Burnette, David [1 ]
Lempert, Walter R. [1 ]
Adamovich, Igor V. [1 ]
机构
[1] Ohio State Univ, Dept Mech & Aerosp Engn, Columbus, OH 43210 USA
[2] Moscow MV Lomonosov State Univ, Skobeltsyn Inst Nucl Phys, Moscow 119991, Russia
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2014年 / 23卷 / 06期
基金
美国国家科学基金会;
关键词
electric discharges; plasma simulation; afterglow plasma chemistry; chemical reaction kinetics; PLASMA-ASSISTED IGNITION; VIBRATIONAL-EXCITATION; SEPARATION CONTROL; OXYGEN; N-2; COMBUSTION; SIMULATION; MIXTURES;
D O I
10.1088/0963-0252/23/6/065003
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The present kinetic modelling calculation results provide key new insights into the kinetics of vibrational excitation of nitrogen and plasma chemical reactions in nanosecond pulse, 'diffuse filament' discharges in nitrogen and dry air at a moderate energy loading per molecule, similar to 0.1 eV per molecule. It is shown that it is very important to take into account Coulomb collisions between electrons because they change the electron energy distribution function and, as a result, strongly affect populations of excited states and radical concentrations in the discharge. The results demonstrate that the apparent transient rise of N-2 'first level' vibrational temperature after the discharge pulse, as detected in the experiments, is due to the net downward V-V energy transfer in N-2-N-2 collisions, which increases the N-2(X (1)Sigma, nu = 1) population. Finally, a comparison of the model's predictions with the experimental data shows that NO formation in the afterglow occurs via reactive quenching of multiple excited electronic levels of nitrogen molecule, N-2(*), by O atoms.
引用
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页数:12
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