Metal alloy and monoelemental nanoclusters in silica formed by sequential ion implantation and annealing in selected atmosphere

被引:5
|
作者
Ren, F
Jiang, CZ [1 ]
Chen, HB
Shi, Y
Liu, C
Wang, JB
机构
[1] Wuhan Univ, Dept Phys, Wuhan 430072, Peoples R China
[2] Wuhan Univ, Ctr Electron Microscopy, Wuhan 430072, Peoples R China
[3] Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
ion implantation; nanocluster composites; alloy; annealing;
D O I
10.1016/j.physb.2004.09.005
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The preparation of metal alloy and monoelemental nanoclusters in silica by Ag, Cu ion sequential implantation and annealing in selected oxidizing or reducing atmosphere is studied. The formation of metastable Ag-Cu alloy is verified in the as-implanted samples by optical absorption spectra, selected area electron diffraction and energy dispersive spectrometer spectrum. The alloy is discomposed at elevated annealing temperature in both oxidizing and reducing atmospheres. The different effects of annealing behaviors on the Ag Cu alloy nanoclusters are investigated. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:92 / 97
页数:6
相关论文
共 50 条
  • [31] Potentialities of ion implantation for the synthesis and modification of metal nanoclusters
    Mazzoldi, P.
    Mattei, G.
    RIVISTA DEL NUOVO CIMENTO, 2005, 28 (07): : 1 - 69
  • [32] The effect of Ti and O on the optical properties and microstructure of Ag nanocrystals formed in silica by sequential ion implantation
    Magruder, R. H., III
    Meldrum, Al
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2007, 353 (52-54) : 4813 - 4818
  • [33] Selenium nanoparticles formed by ion implantation into fused silica
    Henderson, DO
    Wu, M
    Ueda, A
    Tung, YS
    Mu, R
    Chen, JT
    Gu, Z
    Collins, WE
    White, CW
    Budai, J
    Meldrum, A
    Zuhr, RA
    Zhu, JG
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 141 (1-4): : 284 - 288
  • [34] Pd-based alloy nanoclusters in ion-implanted silica: Formation and stability under thermal annealing
    Battaglin, G
    Cattaruzza, E
    De Marchi, G
    Gonella, F
    Mattei, G
    Maurizio, C
    Mazzoldi, P
    Parolin, M
    Sada, C
    Calliari, I
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 191 : 392 - 395
  • [35] Additive Ion Implantation in Gallium Arsenide by Forming Alloy Nanoclusters
    Perinskaya, I. V.
    Perinsky, V. V.
    Rodionov, I. V.
    Kuts, L. E.
    INORGANIC MATERIALS-APPLIED RESEARCH, 2023, 14 (03) : 604 - 609
  • [36] Additive Ion Implantation in Gallium Arsenide by Forming Alloy Nanoclusters
    I. V. Perinskaya
    V. V. Perinsky
    I. V. Rodionov
    L. E. Kuts
    Inorganic Materials: Applied Research, 2023, 14 : 604 - 609
  • [37] Au-Cu and Pd-Cu nanoclusters obtained by ion implantation in silica: stability under thermal annealing
    Mattei, G
    Maurizio, C
    Sada, C
    Mazzoldi, P
    Fernandez, CD
    Cattaruzza, E
    Battaglin, G
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 345 : 667 - 670
  • [38] Conductive layers in diamond formed by hydrogen ion implantation and annealing
    Popov, V. P.
    Safronov, L. N.
    Naumova, O. V.
    Nikolaev, D. V.
    Kupriyanov, I. N.
    Palyanov, Yu N.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2012, 282 : 100 - 107
  • [39] Temperature dependence and annealing effects of absorption edges for selenium quantum dots formed by ion implantation in silica glass
    Ueda, A
    Wu, M
    Mu, R
    Tung, YS
    Henderson, DO
    Meldrum, A
    Zuhr, RA
    Budai, JD
    White, CW
    Keay, JC
    Feldman, LC
    PHASE TRANSFORMATIONS AND SYSTEMS DRIVEN FAR FROM EQUILIBRIUM, 1998, 481 : 501 - 506
  • [40] Temperature dependence and annealing effects of absorption edges for selenium quantum dots formed by ion implantation in silica glass
    Ueda, A.
    Wu, M.
    Aga, R.
    Meldrum, A.
    White, C. W.
    Collins, W. E.
    Mu, R.
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (19-20): : 8542 - 8546