Changes in surface states of sapphire irradiated by low energy electron beam

被引：0
|
作者：
Oguri, K [1 ]
Nishi, Y
机构：
[1] Tokai Univ, Dept Phys, Hiratsuka, Kanagawa 2591292, Japan
[2] Tokai Univ, Dept Mat Sci, Hiratsuka, Kanagawa 2591292, Japan
来源：
JOURNAL OF THE JAPAN INSTITUTE OF METALS | 2004年 / 68卷 / 10期
关键词：
electron beam; sapphire; wettability; surface energy; mist resistance;
D O I：
10.2320/jinstmet.68.880
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
When the time to clear vision is used as an indicator of mist resistance, we found that the low energy electron beam irradiation enhanced the mist resistance for sapphire lens surface setting on endoscope top. In order to explain the mist resistance by low energy electron beam irradiation, influences of electron beam irradiation on surface conditions were investigated. The electron beam irradiation increased the surface energy. Based on the results of X-ray photoelectron spectroscopy, the electron beam irradiation enhanced the bonding rates of -C-O- and -C-O-O- and decreased -C-C- bonding rate. Thus, the electron beam irradiation decreased contact angle of sessile water drop and increased surface energy, resulting in generating mist resistance of the treatment.
引用
收藏
页码：880 / 882
页数：3
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