New approach to nanocomposites of polyimides containing polyhedral oligomeric silsesquioxane for dielectric applications

被引：81
|
作者：
Chen, YW
Kang, ET
机构：
[1] Nanchang Univ, Sch Mat Sci & Engn, Nanchang 330047, Peoples R China
[2] Natl Univ Singapore, Dept Chem Engn, Singapore 119260, Singapore
来源：
MATERIALS LETTERS | 2004年 / 58卷 / 29期
关键词：
dielectrics; nanocomposites; POSS; graft polymerization; polyimide;
D O I：
10.1016/j.matlet.2004.08.001
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Low dielectric constant nanocomposites of polyintides with grafted methacrylate side chains containing polyhedral oligomeric silsesquioxane (POSS) were successfully synthesized by thermally initiated free-radical graft copolymerization of methacrylcyclopentyl-POSS (MA-POSS) with the ozone-preactivated poly(arnic acid), followed by thermal imidization. The dielectric constant of the film can be tuned by varying the molar ratio of the grafted MA-POSS side chains in the copolymer. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码：3716 / 3719
页数：4
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