Rapid thermal annealing of tungsten silicide films

被引：0

作者：

Fabricius, A ^{[1
]}

Nennewitz, O ^{[1
]}

Spiess, L ^{[1
]}

Cimalla, V ^{[1
]}

Pezoldt, J ^{[1
]}

机构：

[1] TECH UNIV ILMENAU,INST WERKSTOFFE,D-98684 ILMENAU,GERMANY

来源：

SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS | 1996年 / 402卷

关键词：

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：625 / 630

页数：6

共 50 条

[1] RAPID THERMAL ANNEALING OF CO-SPUTTERED TANTALUM SILICIDE FILMS
KWONG, DL
[J]. THIN SOLID FILMS, 1984, 121 (01) : 43 - 50
[2] SELECTIVE TUNGSTEN SILICIDE FORMATION BY ION-BEAM MIXING AND RAPID THERMAL ANNEALING
TSAUR, BY
CHEN, CK
ANDERSON, CH
KWONG, DL
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) : 1890 - 1894
[3] CONDUCTIVITY CHANGES IN TUNGSTEN SILICIDE FILMS DUE TO RAPID THERMAL-PROCESSING
JAYADEV, TS
JOSHI, A
[J]. ELECTRONICS LETTERS, 1984, 20 (14) : 604 - 606
[4] CHARACTERIZATION OF TITANIUM SILICIDE FILMS FORMED BY COMPOSITE SPUTTERING AND RAPID THERMAL ANNEALING
BROADBENT, EK
MORGAN, AE
COULMAN, B
HUANG, IW
KUIPER, AET
[J]. THIN SOLID FILMS, 1987, 151 (01) : 51 - 63
[5] RAPID THERMAL ANNEALING AND TITANIUM SILICIDE FORMATION
LEVY, D
PONPON, JP
GROB, A
GROB, JJ
STUCK, R
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 38 (01): : 23 - 29
[6] FORMATION OF PALLADIUM SILICIDE BY RAPID THERMAL ANNEALING
LEVY, D
GROB, A
GROB, JJ
PONPON, JP
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1984, 35 (03): : 141 - 144
[7] MANUFACTURABILITY ISSUES RELATED TO TRANSIENT THERMAL ANNEALING OF TITANIUM SILICIDE FILMS IN A RAPID THERMAL PROCESSOR
SHENAI, K
[J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1991, 4 (01) : 1 - 8
[8] SHORT-TIME ANNEALING OF COEVAPORATED TUNGSTEN SILICIDE FILMS
SEDGWICK, TO
DHEURLE, FM
COHEN, SA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C99 - C99
[9] SHORT-TIME ANNEALING OF COEVAPORATED TUNGSTEN SILICIDE FILMS
SEDGWICK, TO
DHEURLE, FM
COHEN, SA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (10) : 2446 - 2451
[10] OXYGEN IMPURITY EFFECTS ON THE FORMATION OF THIN TITANIUM SILICIDE FILMS BY RAPID THERMAL ANNEALING
HEINTZE, M
CATANA, A
SCHMID, PE
LEVY, F
STADELMANN, P
WEISS, P
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1990, 23 (08) : 1076 - 1081

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