Diffraction-efficiency Correction of Polarization-independent Multilayer Dielectric Gratings

被引:0
|
作者
Cho, Hyun-Ju [1 ]
Kim, Gwan-Ha [2 ]
Kim, Dong Hwan [3 ]
Lee, Yong-Soo [3 ]
Kim, Sang-In [3 ]
Cho, Joonyoung [3 ]
Kim, Hyun Tae [3 ]
机构
[1] Optonics Co Ltd, Gwangju 61003, South Korea
[2] Korea Polytech Seongnam Campus, Dept Semicond Mat & Applicat, Seongnam 13122, South Korea
[3] Hanwha Co, Laser & Sensor Syst, Sungnam 13488, South Korea
关键词
Dielectric multilayer mirror; Diffraction efficiency; Polarization-independent; Reflection grating; Spectral beam combining; ION-ASSISTED DEPOSITION; HIGH-POWER; DESIGN; ENERGY;
D O I
10.3807/KJOP.2022.33.1.022
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We fabricate a polarization-independent dielectric multilayer thin-film diffraction grating for a spectral-beam-combining (SBC) system with a simple grating structure and low aspect ratio. Due to the refractive index and thickness error of the manufactured thin films, the diffraction efficiency of the fabricated diffraction grating was lower than that of the design. The causes of the errors were analyzed, and it was confirmed through simulation that diffraction efficiency could be compensated through an additional coating on the manufactured diffraction grating. As a result of sputtering an additional Ta2O5 layer on a fabricated diffraction grating, the diffraction efficiency was corrected and a maximum 91.7% of polarization-independent diffraction efficiency was obtained.
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页码:22 / 27
页数:6
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