Changes of plasma potential induced by ion-beam injection

被引：5

作者：

Honzawa, T

Saito, R

Saitou, Y

机构：

[1] Dept. of Elec. and Electron. Eng., Utsunomiya University

来源：

PHYSICS OF PLASMAS | 1996年 / 3卷 / 01期

关键词：

D O I：

10.1063/1.871827

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

It is experimentally clarified that injection of a stationary ion beam always changes the background plasma potential in a beam-plasma system. In this experiment, a technique of ion energy analysis is adopted to determine the plasma potential in the system. Results show that the plasma potential changes sensitively depending on the beam-to-plasma density ratio, even if other parameters an not allowed to vary. Finally, all the results obtained here are tentatively explained with the help of a Boltzmann relation. (C) 1996 American Institute of Physics.

引用

页码：89 / 93

页数：5

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