Formation of diamond films by pulsed discharge DC plasma CVD

被引：0
|
作者：
Noda, M [1 ]
机构：
[1] Aichi Univ Educ, Dept Integrat Nat Sci, Kariya, Aichi 4488542, Japan
来源：
NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY | 2000年 / 10卷 / 01期
关键词：
diamond film; pulsed discharge; plasma CVD; structural change;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：32 / 32
页数：1
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