Continuous formation and faceting of SiGe islands on Si(100)

被引:32
|
作者
Sutter, P [1 ]
Zahl, P [1 ]
Sutter, E [1 ]
机构
[1] Colorado Sch Mines, Dept Phys, Golden, CO 80401 USA
关键词
D O I
10.1063/1.1577386
中图分类号
O59 [应用物理学];
学科分类号
摘要
The multiscale mechanisms leading to the formation of faceted quantum dot (QD) islands during Si1-xGex/Si(100) heteroepitaxy were studied by scanning tunneling microscopy. The entire evolution from an initial morphological instability of the strained alloy to final {105} faceted pyramidal QD islands is continuous. Shallow mounds, generated by the alloy instability, are bounded by alternating (100) terraces and single-layer steps. Growth of the mounds in height without lateral expansion drives a continuous increase in mound slope and step density up to a critical angle of about 6degrees. Kinetic constraints then force the nucleation of small {105} protofacets, which expand and ultimately coalesce to form the {105} facets bounding pyramidal QD islands. (C) 2003 American Institute of Physics.
引用
收藏
页码:3454 / 3456
页数:3
相关论文
共 50 条
  • [41] Growth mechanisms of SiGe on (111) and (100) Si substrates
    CNRS, Marseille, France
    Thin Solid Films, 1-2 (22-26):
  • [42] Fabrication of SiGe quantum dots on a Si(100) surface
    Thanh, VL
    Bouchier, D
    Debarre, D
    PHYSICAL REVIEW B, 1997, 56 (16): : 10505 - 10510
  • [43] Interaction of Co with SiGe epilayer grown on Si(100)
    Prabhakaran, K
    Sumitomo, K
    Ogino, T
    SURFACE SCIENCE, 1999, 421 (1-2) : 100 - 105
  • [44] Co silicide formation on SiGeC/Si and SiGe/Si layers
    Donaton, RA
    Maex, K
    Vantomme, A
    Langouche, G
    Morciaux, Y
    StAmour, A
    Sturm, JC
    APPLIED PHYSICS LETTERS, 1997, 70 (10) : 1266 - 1268
  • [45] Composition and structure of Ge islands grown on Si(001) and of SiGe grown on Si mesa
    Regelman, DV
    Magidson, V
    Beserman, R
    Dettmer, K
    THIN FILMS EPITAXIAL GROWTH AND NANOSTRUCTURES, 1999, 79 : 73 - 75
  • [46] Composition and structure of Ge islands grown on Si(001) and of SiGe grown on Si mesa
    Regelman, DV
    Magidson, V
    Beserman, R
    Dettmer, K
    THIN SOLID FILMS, 1998, 336 (1-2) : 73 - 75
  • [47] Macroscopic one-dimensional faceting of Si(100) upon Au adsorption
    Horn-von Hoegen, M
    Minoda, H
    Yagi, K
    Heringdorf, FMZ
    Kahler, D
    SURFACE SCIENCE, 1998, 402 (1-3) : 464 - 469
  • [48] Stability of ensembles of Ge/Si(100) islands
    Zhang, Y
    Drucker, J
    MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF HETEROEPITAXIAL SEMICONDUCTOR THIN FILMS, 2000, 618 : 123 - 128
  • [49] FORMATION OF EPITAXIAL SI1-XGEX FILMS PRODUCED BY WET OXIDATION OF AMORPHOUS SIGE LAYERS DEPOSITED ON SI(100)
    PROKES, SM
    TSENG, WF
    CHRISTOU, A
    APPLIED PHYSICS LETTERS, 1988, 53 (25) : 2483 - 2485
  • [50] Self-assembled SiGe islands with uniform shape and size by controlling Si concentration in islands
    Deng, N
    Chen, PY
    Li, ZJ
    JOURNAL OF CRYSTAL GROWTH, 2004, 263 (1-4) : 21 - 24