Continuous formation and faceting of SiGe islands on Si(100)

被引:32
|
作者
Sutter, P [1 ]
Zahl, P [1 ]
Sutter, E [1 ]
机构
[1] Colorado Sch Mines, Dept Phys, Golden, CO 80401 USA
关键词
D O I
10.1063/1.1577386
中图分类号
O59 [应用物理学];
学科分类号
摘要
The multiscale mechanisms leading to the formation of faceted quantum dot (QD) islands during Si1-xGex/Si(100) heteroepitaxy were studied by scanning tunneling microscopy. The entire evolution from an initial morphological instability of the strained alloy to final {105} faceted pyramidal QD islands is continuous. Shallow mounds, generated by the alloy instability, are bounded by alternating (100) terraces and single-layer steps. Growth of the mounds in height without lateral expansion drives a continuous increase in mound slope and step density up to a critical angle of about 6degrees. Kinetic constraints then force the nucleation of small {105} protofacets, which expand and ultimately coalesce to form the {105} facets bounding pyramidal QD islands. (C) 2003 American Institute of Physics.
引用
收藏
页码:3454 / 3456
页数:3
相关论文
共 50 条
  • [1] Barrierless formation and faceting of SiGe islands on Si(001) -: art. no. 196104
    Tersoff, J
    Spencer, BJ
    Rastelli, A
    von Känel, H
    PHYSICAL REVIEW LETTERS, 2002, 89 (19)
  • [2] Island formation and faceting in the SiGe/Si(001) system
    Rastelli, A
    von Känel, H
    SURFACE SCIENCE, 2003, 532 : 769 - 773
  • [3] SiGe intermixing in Ge/Si(100) islands
    Capellini, G
    De Seta, M
    Evangelisti, F
    APPLIED PHYSICS LETTERS, 2001, 78 (03) : 303 - 305
  • [4] Faceting and nanostructure effects in Si and SiGe epitaxy
    Dutartre, Didier
    Seiss, Birgit
    Campidelli, Yves
    Pellissier-Tanon, Denis
    Barge, David
    Pantel, Roland
    THIN SOLID FILMS, 2012, 520 (08) : 3163 - 3169
  • [5] Si and SiGe faceting during selective epitaxy
    Pribat, Clement
    Servanton, Germain
    Depoyan, Linda
    Dutartre, Didier
    SOLID-STATE ELECTRONICS, 2009, 53 (08) : 865 - 868
  • [6] Nucleationless island formation in SiGe/Si(100) heteroepitaxy
    Sutter, P
    Lagally, MG
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 89 (1-3): : 45 - 48
  • [7] Evolution and stability of ordered SiGe islands grown on patterned Si(100) substrates
    Dais, C.
    Mussler, G.
    Sigg, H.
    Mueller, E.
    Solak, H. H.
    Gruetzmacher, D.
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (12)
  • [8] ARSENIC INDUCED FACETING OF VICINAL SI(100)
    OHNO, TR
    WILLIAMS, ED
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (11): : L2061 - L2064
  • [9] Global faceting behavior of strained Ge islands on Si
    Robinson, Jeremy T.
    Rastelli, Armando
    Schmidt, Oliver
    Dubon, Oscar D.
    NANOTECHNOLOGY, 2009, 20 (08)
  • [10] Shapes of the Micron-Sized SiGe Islands Grown on Si(100) in Dewetting Conditions
    Budazhapova, Anastasia E.
    Shklyaev, Alexander A.
    2018 19TH INTERNATIONAL CONFERENCE OF YOUNG SPECIALISTS ON MICRO/NANOTECHNOLOGIES AND ELECTRON DEVICES (EDM 2018), 2018, : 16 - 18